青云翻译

The resist mask is not that part of the film surface chemical reactions and reagents were removed.

The part without photoresist masking film and reagents for chemical reactions would be removed.

Except that does not cause occurs by the slushing compound concealed that part of thin film surface and the reagent the chemical reaction.

So that was not anti-corrosion agent masking that part of the membrane surface and reagents react chemically removed.

The part without photoresist masking film and reagents for chemical reactions would be removed.